Below, you can find the list of equipment available in Class 100 Cleanroom. A few are already available for use, others are being installed and will become available later.
Please use the booking system to use the equipment.
Electron-Beam Lithography (Royce EBL Suite)Model: EBPG 5200, Raith GMBH (will be available in December 2017) A state-of-the-art high-resolution/throughput Electron-Beam Lithography system capable of exposing 8-inch waters. |
Laser WriterModel: LW-405B+, Microtech Srl Available for use. Used for the direct-write contactless optical lithography. Available wavelengths: 385 and 405nm. Best resolution (linewidth) is 0.6micron. |
NanoimprinterModel: Obducat Eitre 6 with UV curing option. Will be available in August 2017.
The tool is used for high resolution nanoimprinting. |
Resist Preparation wetbenchThe wetbench is equipped with three spinners and four precision hotplates from EMS. Available for use.
Processes available: - SU-8 negative photo-resists - AZ/LOR positive and negative photo-resists - PMMA/ZEP e-beam resists |
Development and Cleaning wetbenchThis wetbench is used for preparation of samples for lithography, as well post-processing (development, etc.) Available for use. |
HF Acid bench |
Triple FurnaceThe tool is used for deep oxidation of Si Will be available for use in September 2017. |
When in the Cleanroom, please follow the local rules.